Interface controlled microstructure evolution in nanolayered thin films

نویسندگان

  • M. Bartosik
  • J. Keckes
  • P. H. Mayrhofer
چکیده

Article history: Received 17 March 2016 Received in revised form 21 May 2016 Accepted 22 May 2016 Available online 7 June 2016 X-ray nano-diffraction and transmission electron microscopy were conducted along the thickness of a ~4 μm thick CrN/AlN multilayer with continuously increasing AlN layer thicknesses from ~1 to 15 nm on ~7 nm thick CrN template layers. The experiments reveal coherent growth, large columnar grains extending over several (bi-)layers for thin AlN layer thicknesses below ~4 nm. Above ~4 nm, the nucleation of the thermodynamically stable wurtzite structured AlN is favored, leading to coherency breakdown and reduction of the overall strains, disrupting the columnar microstructure and limiting the maximum grain size in film growth direction to the layer thickness. © 2016 Acta Materialia Inc. Published by Elsevier Ltd. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Multilayered and nanolayered hard nitride thin films for a better yield in micro machining

TiN/AlTiN ; TiN/CrN and CrN/AlTiN multilayer coatings have been deposited by the cathodic arc evaporation technique. The period is in the range 7 – 200 nm for a total thichness of 3 μm. The period’s control of the nanoscaled hard films is achieved, a priori, by way of a simple geometrical calculation and, a posteriori, via both X-ray diffraction and transmission electron microscopy on cross-sec...

متن کامل

Microstructure Evolution and Thermoelectric Property of Pt-PtRh Thin Film Thermocouples

Due to their small size, extremely fast response, and low cost, refractory metallic thin film thermocouples (TFTCs) are well suited for the surface temperature measurement of hot components. In this study, PtRh films with different amounts of Rhodium (10% and 13%) were deposited with direct current magnetron sputtering and annealed at different temperatures in air. The chemistry, microstructure...

متن کامل

Phase separation during co-deposition of Al-Ge thin films

We present the results of a combined experimental and theoretical investigation of phase separation and microstructure development in co-deposited Al-Ge thin films. For small film thicknesses and deposition temperatures above 150 °C the phase-separated films consist of an array of domains of the Aland Ge-rich terminal phases (lateral phase separation). Films deposited at 100 °C or less containe...

متن کامل

Microstructure and optical properties of scandium oxide thin films prepared by metalorganic chemical-vapor deposition

Dense, high-index, and reproducible scandium oxide (Sc2O3) thin films with high mechanical strength were grown on glass substrates by metalorganic chemical-vapor deposition. The influence of deposition temperature on the microstructure evolution and optical properties of Sc2O3 thin films was investigated by x-ray diffraction, scanning electron microscopy, atomic-force microscopy, transmission e...

متن کامل

Mechanisms of intrinsic stress formation in thin film systems

The effect of the adatom surface diffusivity on the evolution of the microstructure and the intrinsic stress of thin metal films was investigated for the case of growth of polycrystalline Ag films on amorphous SiO2 (a-SiO2) and amorphous Ge (a-Ge) substrates, with high and low Ag adatom surface diffusivity, respectively. The surface diffusivity of the deposited Ag adatoms on the a-Ge substrate ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2016